Ultrathin films (50-150nm thick) cuprous oxide (Cu₂O) thin films were deposited by low temperature thermal oxidation technique. The structural, optical and photoelectrochemical properties of the thin films were investigated. X-ray diffraction (XRD) and high resolution scanning electron microscope (SEM) was used to study the phase composition and the thin films’ microstructure respectively. XRD results showed that Cu₂O was the dominant phase albeit some trace CuO peaks were also observed indicating surface formation of an extremely layer of CuO probably during the cooling process following either deposition or during the annealing steps. SEM showed a highly nanostructure consisting long narrow nanorods with broadening to the surface but with extremely narrow, sharp cylindrical roots standing on the substrate. Photoelectrochemical properties of the films were studied via a standard three electrode using a saturated calomel cell (SCE).