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  <record>
    <language>eng</language>
    
      <publisher>Oriental Scientific Publishing Company</publisher>
    
    <journalTitle>Material Science Research India</journalTitle>
    
      <issn>0973-3469</issn>
    
    
    <publicationDate>2008-02-05</publicationDate>
    

        <volume>5</volume>

        <issue>1</issue>

 

    <startPage>203</startPage>
    <endPage>204</endPage>

   
    <publisherRecordId>1981</publisherRecordId>
    <documentType>article</documentType>
    <title language="eng">Hole-Phonon Scattering Mechanism in Iii-V Semiconductor Multiple Quantum Wells</title>

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    <abstract language="eng"><p>Analysis of carrier transport while moving through GaN multiple quantum well has been carried out through phonon scattering using Fermi Golden rule. Hole capture in a Gallium Nitride quantum wells has been carried out with hole-optical phonon scattering mechanism using semi-classical approach. Our analysis show that the hole capture time vary as a function of the excess energy, quantum well width, barrier width and aluminum (Al) mole fraction in the barrier layer. Strong dependence of hole capture time on mole fraction x in the barrier layer of AlxGa1-xN has been attributed to the variation of energy and barrier height. The form factor varies in an oscillatory manner with the change in energy.</p></abstract>

    <fullTextUrl format="html">https://www.materialsciencejournal.org/vol5no1/hole-phonon-scattering-mechanism-in-iii-v-semiconductor-multiple-quantum-wells/</fullTextUrl>




      <keywords language="eng">
        <keyword>Carrier transport</keyword>
      </keywords>


      <keywords language="eng">
        <keyword> phonon scattering and Fermi Golden rule</keyword>
      </keywords>

  </record>

</records>