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  <record>
    <language>eng</language>
    
      <publisher>Oriental Scientific Publishing Company</publisher>
    
    <journalTitle>Material Science Research India</journalTitle>
    
      <issn>0973-3469</issn>
    
    
    <publicationDate>2011-12-10</publicationDate>
    

        <volume>8</volume>

        <issue>2</issue>

 

    <startPage>315</startPage>
    <endPage>319</endPage>

   
      <doi></doi>
    
    <publisherRecordId>2665</publisherRecordId>
    <documentType>article</documentType>
    <title language="eng">Structural and Low Temperature Electrical Properties of A Nickel/Iron Multilayer</title>

    <authors>
	 


      <author>
       <name>P. J. Sadashivaiah</name>

 
		

	<affiliationId>1</affiliationId>
      </author>
    


	 


      <author>
       <name>T. Sujatha</name>


		

	<affiliationId>2</affiliationId>

      </author>
    


	 


      <author>
       <name>T. Sankarappa</name>

		

	<affiliationId>1</affiliationId>
      </author>
    


	 


      <author>
       <name>Santosh Kumar</name>

		

	<affiliationId>1</affiliationId>
      </author>
    



	 


      <author>
       <name>A. K. Bhatnagar</name>

		

	<affiliationId>3</affiliationId>
      </author>
    



	

    </authors>
    
	    <affiliationsList>
	    
		

		<affiliationName affiliationId="1">Department of Physics, Gulbarga University, Gulbarga - 585 106, India. </affiliationName>
    


		

		<affiliationName affiliationId="2">H.P.S. Kalkhora, Basavakalyan (Tq), Bidar (Dt), India.</affiliationName>
    

		

		<affiliationName affiliationId="3">School of Physics, Hyderabad University, Gachibowli, Hyderabad, India</affiliationName>
    

		

		

		

	  </affiliationsList>







    <abstract language="eng"><p>A multilayer, [Ni(100nm)/Fe(100nm)]<sub>5</sub> has been deposited by electron beam evaporation method under high vacuum at 473 K. The structure and grain size were investigated by the grazing incidence X-ray diffraction (GIXRD) studies. The surface roughness was determined by atomic force microscope (AFM). Electrical resistivity has been measured in the temperature range from 4.2K to 300 K. The resistivity increased with increase in temperature. The residual resistivity ratio (RRR) and the temperature coefficient of resistivity (TCR) were determined. The power law variations of resistivity with temperature were established. For temperature, T, above 80K, the resistivity exponent was found to be slightly more than unity and it was nearly 5 for temperature below 30K. The contributions to resistivity for T above 80K are attributed to be predominant by electron-phonon and electron-magnon scatterings and for below 30K they are ascribed to be predominant by electron-electron and electron-defect scattering.</p></abstract>

    <fullTextUrl format="html">https://www.materialsciencejournal.org/vol8no2/structural-and-low-temperature-electrical-properties-of-a-nickeliron-multilayer/</fullTextUrl>




      <keywords language="eng">
        <keyword>Multilayers</keyword>
      </keywords>


      <keywords language="eng">
        <keyword> Surface roughness</keyword>
      </keywords>


      <keywords language="eng">
        <keyword> Resistivity</keyword>
      </keywords>


      <keywords language="eng">
        <keyword> Residual resistivity ratio (RRR)</keyword>
      </keywords>

  </record>

</records>