Studies on Growth Kinetics of Cdin2te4 Thin Films

DOI : http://dx.doi.org/10.13005/msri/050228

Download this article as: 

Thin film deposition processes play a critical role in the production of high-density, high-performance microelectronic products. Considerable progress has been achieved in the development of deposition processes and in the development of the reactor systems in which they are carried out. In recent year, thin film have attracted more because of their varied applications such as semi conducting devices1-2, photovoltaic, optoelectronic device, radiation detector, laser materials, thermoelectric devices, solar energy converter.etc. 1-4. Ultra thin films are two- dimensional micro material, which are obtained by DC electro deposition technique4 on surface of stainless steel from an aqueous acidic bath containing CdSO4, InCl3 TeO2. The growth kinetics was studies by knowing effect of pH of electrolyte bath, optimizing time of deposition. An effect of bath pH is studied by measuring ISC and Voc. Effectiveness of current –voltage characteristic was studied by plotting values of I vs V. X-ray diffraction analysis of the deposited film showed the presence of polycrystalline nature with tetrahedral structure with lattice parameter a = 6.205, b=6.205, c =12.405. From X-ray diffraction (XRD) analysis interplanner distance, particle sizes have been calculated. Surface morphology studies by scanning electron microscope (SEM) shows that, the deposition films are well adherent and grains with grain size 0.22 μm² and particle size 1.4671A0 are uniformly distribution over the surface entire of the substrate

Thin film; Electro deposition; crystal structure; XRD; SEM