Low Temperature Studies of Resistivity and Magnetoresistivity in Al/Co/Al/Cr/Al Films


Santosh Kumar, T. Sankarappa* and P.J. Sadashivaiah

Department of Physics, Gulbarga University, Gulbarga - 585 106 (India).

DOI : http://dx.doi.org/10.13005/msri/060232

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ABSTRACT:

A set of films, Al/Co(d)/Al/Cr(d)/Al where d = 5nm, 10nm, 15nm, 20nm have been deposited at room temperature under high vacuum conditions. They were investigated for resistivity in the temperature range from 30K to 300K and room temperature magnetoresistivity. The residual resistance ratio (RRR), temperature coefficient of resistance (TCR) and activation energy for dc conduction have been determined. From the magnetoresistivity, percentage of magnetoresistance (MR%) has been determined. At a temperature of 300K and field of 7.5 kG, maximum of 0.025 MR% has been observed in a film. Power laws, for the resistivity-temperature behaviour has been empirically established. It is for the first time that a set of sandwich films in the present configurations have been explored for resistivity at low temperature and magnetoresistivity at room temperature.

KEYWORDS:

Thin film; multilayers; magnetoresistivity. PACS: 73.61.At; 73.40.-c; 73.20.-r; 73.63.Hs

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Article Publishing History
Received on: 18 Jun 2009
Accepted on: 5 Aug 2009


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ISSN

Print: 0973-3469, Online: 2394-0565


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