Structural And Optical Characterization Of DC Reactive Magnetron Sputtered Cu3N Films

Abstract
Keywords
Introduction
Materials and Methods
Results
Discussion
Conclusion
Acknowledgement
Funding Sources
Conflict of Interest
Data Availability Statement
Ethics Statement
References

Article | Open Access

Structural And Optical Characterization Of DC Reactive Magnetron Sputtered Cu3N Films

Volume 5, Number 1

K. Venkata Subba Reddy, P. Sreedhara Reddy and S. Uthanna

Department of Physics, Sri Venkateswara University, Tirupati - 517 502 (India)

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ABSTRACT:

Dc reactive magnetron sputtering technique was employed for deposition of copper nitride films on glass substrates under different sputtering pressures in the range 1x10-2 – 1x10-1 mbar. The influence of sputtering pressure on the structural and optical properties was systematically investigated.

KEYWORDS:

DC reactive magnetron sputtered Cu3N films

Article Publishing History

Received on: 10 Jan 2008