Effect of Current Density on the Anodic Behaviour of Zircaloy-4 and Niobium: A Comparitive Study

V. Jeevana Jyothi¹* and Ch. Anjaneyulu²

*Department of Chemistry, R.B.V.R.R.Women?s College, Narayanguda (India).

Department of Chemistry, University College for Women, Osmania University, Hyderabad - 500 007 (India).

DOI : http://dx.doi.org/10.13005/msri/050226

ABSTRACT:

The kinetics of anodic oxidation of zircaloy-4 and niobium have been studied at current densities ranging from 4 to 10 mA cm -2 at room temperature in order to investigate the dependence of ionic current density on the field across the oxide film. Thickness of the anodic films were estimated from capacitance data. The formation rate, current efficiency and differential field were found to increase with increase in the ionic current density for zircaloy-4 and niobium. From linear plots of logarithm of ionic current density vs differential field, and applying the Cabrera-Mott theory, the half-jump distance and height of energy barrier are deduced and compared.

KEYWORDS: Anodization; current density; differential field; Cabrera-Mott theory; zircaloy-4; niobium

Copy the following to cite this article: Jyothi V. J, Anjaneyulu Ch. Effect of Current Density on the Anodic Behaviour of Zircaloy-4 and Niobium: A Comparitive Study. Mat.Sci.Res.India;5(2)

Copy the following to cite this URL: Jyothi V. J, Anjaneyulu Ch. Effect of Current Density on the Anodic Behaviour of Zircaloy-4 and Niobium: A Comparitive Study. Mat.Sci.Res.India;5(2). Available from: http://www.materialsciencejournal.org/?p=2081

---

This work is licensed under a Creative Commons Attribution 4.0 International License.